SAN FRANCISCO — Amid probable delays for extreme ultraviolet (EUV) lithography, ASML, Canon and Nikon are updating their roadmaps, racing each other to capitalize on the shift towards ...

Researchers, equipment vendors, and manufacturers alike are watching with growing concern as we creep every closer to the end of 193 nm optical lithography. The problem is not that there are no ...

BELMONT, Calif.--(BUSINESS WIRE)--Nikon Corporation has announced they will provide an immersion scanner for Double Patterning, based on the successful NSR-S610C platform, to their customers in the ...

As the optical lithography advances into the sub-30nm technology node, the various candidates of lithography have been discussed. Double dipole lithography (DDL) has been a primary lithography ...

Applied Materials, Inc. (AMAT), a semiconductor equipment manufacturer (“semi cap”), announced Centura Sculpta last week. According to the company, this tool will help semiconductor manufacturers ...

DNP Achieves 10nm Line pattern resolution on Nanoimprint Lithography (NIL) Template for Cutting-Edge Semiconductors.

In the creative, or desperate, rush to find ways to pattern 10 nm node using double patterning immersion 193nm lithography, a designer from ARM is left “crying in his beer” at the consequent design ...

Gigaphoton (Japan) announced a 104 watt Extreme Ultraviolet (EUV) light source which is a critical part for the realization of the first volume-production-worthy EUV light source target for 2011. It ...

(Nanowerk News) IMEC technologists will present their newest breakthroughs in advanced semiconductor lithography research and development at next week’s SPIE (www.spie.org) Advanced Microlithography ...

SAN JOSE, Calif., Feb. 26, 2024 (GLOBE NEWSWIRE) -- Today at the SPIE Advanced Lithography + Patterning conference, Applied Materials, Inc. introduced a portfolio of products and solutions designed to ...

Even as 28-nm production is ironed out, 20 nm is coming on, bringing with it double-patterning lithography and changes to design-rule checking and other verification parameters. Mentor Graphics' ...